• Full aluminum casing with IP64
• Soft bumper against drops of up to 1 mtr
• Scratch and chemical resistant Gorilla Glass

• Developed inhouse for demanding measurements and highest quality standards
• Outstanding repeatability
• Digital Probes with IP65
• F-adapter for our proven analogue probes

•  Multisensory feedback via LED, sound and vibration
• Errgonomic design
• LI-Batteries with up to 24 h runtime
• USB-C and Bluetooth
• New, innovative software
• Easy data transfer, evaluation and export
• Easy creation of reports and protocols
• Extensive range of accessories
• Professional Service

Hallmarking centers gold testing machines are engineered in accordance with international industrial standard. These are available in various ranges including gold testing machine in hallmarking centres: XAN-FD, gold testing: XAN250, gold testing machine in hallmarking centres: XDAL237 and gold testing machine in hallmarking centres: XDV-SDD. Engineered under the firm direction of experienced quality controllers, these devices are acclaimed for longer service life, accurate measurement and effective performance.

The high-end measurement system Fischerscope X-Ray XAN SDD was developed specifically for non destructive, high precision analysis of thin gold and precious metal coatings. Gold testing machine in hallmarking centres: XDV-SDD is engineered under the firm direction of expert quality controllers. These are basically X-ray fluorescence measuring instrument with a programmable XY-stage and Z-Axis for Automated Measurements of very thin coatings and for trace analysis. These are extensively used as an energy-dispersive X-ray fluorescence measuring instrument for the measurement and analysis of very thin coatings or small concentrations in the trace analysis.

These are universally applicable energy-dispersive X-ray fluorescence measuring instrument widely used for measuring and analyzing very thin coatings or small concentrations in the trace analysis.

These have programmable XY-stage, which make these perfect for auto-mated sample measurements.

These are featured with electrically changeable apertures and primary filters and modern silicon drift detector to ensure high accuracy, good detection sensitivity, long term stability and outstanding accuracy.

These are widely recommended by clients owing to its precise design, robust design, longer service life and effective usage.

These are user-friendly bench-top instrument equipped with programmable XY-stage and an electrically driven Z-axis for automatic measurement.

These are also fitted with a laser pointer, integrated video-microscope with zoom, protective hood and cross-Hairs simplifies sample placement for perfect measurement.

These are operated using the powerful and user-friendly WinFTM® software, for entire operation and evaluation of measurements as well as the clear presentation of measurement data is performed on a PC.

Intended use:Energy dispersive X-ray fluorescence measuring instrument (EDXRF)

to determine thin coatings and alloys

Element range:Aluminum Al (13) to Uranium U (92) – up to 24 elements simultaneously

Design:Bench-top unit with hood opening upwards XY-stage and Z-axis

electrically driven and programmable,Motor-driven changeable apertures

and filters Video camera and laser pointer (class 1) for orienting the sample

Measuring direction:From top to bottom

X-ray tubeMicro focus tungsten tube with beryllium window

High voltageThree steps 10 kV, 30 kV, 50 kV

Aperture (Collimator):4x changeable: Ø 0.2 mm (7.9 mils), Ø 0,6 mm (23.6 mils), Ø 1 mm

(39.4 mils),Ø 3 mm (118 mils), others on request

Primary filter:6x changeable (Ni, free, Al 1000 μm (39.4 mils), Al 500 μm (19.7 mils),

Al 100 μm (3.9 mils), Mylar® 100 μm (3.9 mils)

Measurement spot size:Depending on measurement distance and aperture,Measurement spot

size ≈ aperture size + 10% The actual measurement spot size is shown in the

video image.Smallest measurement spot: approx. Ø 0.25 mm (9.8 mils)

Intended use:Energy dispersive X-ray fluorescence measuring instrument (EDXRF)

  to determine thin coatings and alloys

Element range:Aluminum Al (13) to Uranium U (92) – up to 24 elements simultaneously

Design:Bench-top unit with hood opening upwards XY-stage and Z-axis

electrically driven and programmable,Motor-driven changeable apertures

 and filters Video camera and laser pointer (class 1) for orienting the sample

Measuring direction:From top to bottom

Wafer coating thickness instrument - XUV 773 is one of the most preferred selections of clients owing to its precise design and outstanding accuracy. These are high performance X-ray fluorescence measuring instrument with vacuum chamber for non-destructive coating thickness measurement and material analysis. Engineered in accordance with international industrial standard, these devices are widely used for non-destructive analysis of thin coatings, traces and light elements. Up to 24 elements in the range of sodium (11) to uranium (92) can be determined simultaneously. Ergonomically designed these devices also provide facility for the measurement that it can be performed in vacuum, in ambient air or with helium purge (optional). Therefore also organic or wet samples can be analyzed.

X-Ray standards:DIN ISO 3497 and ASTM B 568

Approval:Individual acceptance inspection as a fully protected instrument according

 to the German regulations „Deutsche Röntgenverordnung-RöV“.